Multibeam Corporation is a leading electron-beam technology innovator. With 30+ U.S. patents issued, the Silicon Valley paces ... etter focuses on developing multicolumn e-beam systems and platforms for four major applications: Complementary E-Beam Lithography (CEBL), Direct Electron Writing (DEW), Direct Deposition/Etch (DDE), and E-Beam Inspection (EBI). Multibeam ChipLock™ DEW Systems embed security information in each IC including chip ID, communication address, and private key encryption. The chip ID guards against counterfeiting and enables supply chain traceability while encryption keys are crucial in authenticating software. IC-embedded security complements software security and extends from IoT to other ICs that populate automobiles, power grids, manufacturing plants, communication networks, transportation networks, and other critical infrastructure. Multibeam Pilot™ CEBL Systems work in a hybrid mode with optical lithography to pattern cuts (of lines in "lines-and-cuts" layout) and holes (i.e., contacts and vias) with no masks. Pilot™ CEBL complements optical litho and eliminates the soaring costs associated with optical multi-patterning in the manufacture of advanced ICs. Further, because Pilot™ CEBL is followed by Etch, the CEBL-Etch sequence can seamlessly incorporate multicolumn EBI. With feedback and feedforward as well as die-to-database comparison, the CEBL-Etch-EBI integrated process greatly accelerates yield ramp. Based in Santa Clara, California, Multibeam is led by Dr. David K. Lam, the founder and first CEO of Lam Research who successfully guided the development and market penetration of his eponymous company's first fully automated plasma etch system. Widely recognized as a key contributor to the growth of the semiconductor industry, Dr. Lam was inducted into the Silicon Valley Engineering Hall of Fame in 2013. read more